MCQ
Which of the following attacks glass
- A$HCl$
- ✓$HF$
- C$HI$
- D$HBr$
$N{a_2}Si{O_3} + 3{H_2}{F_2} \to N{a_2}Si{F_4} + 3{H_2}O$
$CaSi{O_3} + 3{H_2}{F_2} \to CaSi{F_4} + 3{H_2}O$
The etching of glass is based on these reactions.
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Assertion $A$ : The first ionization enthalpy for oxygen is lower than that of nitrogen.
Reason $R$ : The four electrons in $2 p$ orbitals of oxygen experience more electron-electron repulsion.
In the light of the above statements, choose the correct answer from the options given below.
$A.$ has completely filled $\pi$ antibonding molecular orbitals
$B.$ is diamagnetic
$C.$ has bond order one
$D.$ is isoelectronic with Neon